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Material
Date

Silicon wafer signed by Gordon Moore, 2005

2005

Thermally oxidised silicon wafer

1996

Thermally oxidised silicon wafer

1996

Silicon wafer patterned with aluminium

1996

I C chips

1996

Silicon wafer - Low pressure CVD (chemical vapour deposition) oxide

1996

Silicon wafer patterned with aluminium

1996
Plain silicon wafer

Plain silicon wafer

1996
Oxide with patterned photoresist (K1342U/2)

Oxide with patterned photoresist (K1342U/2)

1996
Aluminium deposit (K1342U/4)

Aluminium deposit

1996
After second etch to remove aluminium (K1342U/6)

Silicon wafer after second etch to remove aluminium (K1342U/6)

1996
Silicon wafer for quantum computer

Silicon wafer for quantum computer

2017
Oxidised wafer (K1342U/1)

Oxidised wafer (K1342U/1)

1996
After oxide etch: oxide removed, revealing silicon underneath (K1342U/3)

After oxide etch: oxide removed

1996
Second pattern in photoresist (K1342U/5)

Second pattern in photoresist

1996